MST-HIBP Sweep Plates Design and Plasma/UV Suppression Structure

Jianxin Lei

March 03,1999

ECSE Dept, Rensselaer Polytechnic Institute, Troy, NY 12180

 

Outlines


Introduction

Ion Optics of Sweep Plates

Tansfer matrix method is used in ray tracing

where x0 and dx/dz|0 are position and slope at the entrance to a region, z is horizontal position in a region, f = qV/W, represents deflection strength of the plates, q is ion charge in unit of e, W is ion beam energy in unit of eV, V is the sweep plate voltage in unit of volt, and k=2tan(B) is the slope of the plates.

Fringe Filed Consideration

Equations (1) - (5) are used to determine the sweep plates sizes and to
determine applied voltages needed.

Design of the Primary Sweep Plates

Requirements of the deflection:

For a 200keV primary ion beam, +-20 degrees in poloidal and +-5 degrees in toroidal directions respectively, with maximum 20 kV power supplies.

Crossover sweep design is adopted

The effective sweep center is moved to the entrance port

Back stream design to get a compact structure

Primary toroidal sweep plates

Same design process as that of the poloidal plates

Design of the secondary sweep plates

A large angular range is present on the secondary beamline

Angular range that can be accomodated by the energy analyzer is limited

Characteristics of the electrostatic energy analyzer

Advantages

1. Analyzer is sitting far away from the machine, reduce plasma/UV loading effect

2. Only one pair of poloidal sweep plates is needed

Trajectory calculations through the plasma show that the secondary
ion beams having toloidal angular range much larger than +-5 degrees
degrees that can be handled.
Edge diagnostics and core diagnostics need different secondary
beamline orientations.

Determination of voltages on the secondary sweep plates

Transfer matrice can be used to decide the voltage applied on the secondary sweep plates.

where Vin = dx/dz|0 is initial slope of the trajectory; k = 2tan(B)

In the above, Vin = dx/dz|0 is the initial incident trajectory slope; k = 2tan(B). Therefore, we can decide the voltage on the straight plate (top) is Vs1 = Wb.f1, and voltage on the flared plate (top) is Vs2 = Wb.f2.

Active Beam Control

Solutions of Laplace equation in the sweep regions are used to trace ion beams

Active trajectory control

Plasma/UV Loading Issues

Two sources of electric charges in the sweep region

Voltage will be short out if the power supplies' current limit (10mA ~ 20mA) are exceeded

Loading tests showed that the current loading is plasma dominated

Conclusions

Primary and secondary sweep plates have been designed

Crossover sweep design

A simplified linear model is introduced to treat the fringe fields

Build databases for the sweep information during the initial operation

Plasma suppression structures could be

For more information about the sweep plates design, please refer to the following technique report.

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